Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method

Farizaa, M. and Norazlinab, A. and Azman, T. and Ahmada, M. K. and Murakami, K. (2024) Properties Enhancement of Cu2O/TiO2 Heterostructure Film Using Two-step Hydrothermal and Potentiostatic Deposition Method. International Journal of Nanoelectronics and Materials. pp. 7-12. ISSN 2232-1535

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Abstract

Two-steps hydrothermal were demonstrated to create a high efficiently interfacial layer of TiO2 thin film. The first hydrothermal was conducted to synthesize a well-aligned and compact structure of TiO2 nanorods on FTO substrate. Etching treatment in an acidic medium of hydrochloric acid (HCI) as a second hydrothermal favors increasing the surface area prior to any deposition to be a heterostructure film. The morphology of nanorods changed while the electrical resistivity decreased, demonstrating that the etching treatment had a substantial effect on the TiO2 thin film properties. Cyclic voltammetry (CV) was conducted prior deposition. The electrodeposition of Cu20 on the TiO2 thin film was fabricated by using copper acetate-based solution with pH value of 12.0 at bath temperature of 60°C. The finding revealed that the pyramidal structure of Cu20 film was deposited uniformly, which is believed that the properties of TiO2 interfacial layer were excellently improved.

Item Type:	Article
Uncontrolled Keywords:	Cyclic voltammetry, Etching treatment, Heterostructure, Hydrothermal, Potentiostatic deposition
Subjects:	T Technology > TA Engineering (General). Civil engineering (General)
Divisions:	Faculty of Applied Science and Technology > FAST
Depositing User:	Mr. Mohamad Zulkhibri Rahmad
Date Deposited:	05 May 2025 06:36
Last Modified:	05 May 2025 06:36
URI:	http://eprints.uthm.edu.my/id/eprint/12512

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