Yudistira, Hadi Teguh and Tenggara, Ayodya Pradhipta and Nafisah, Suratun and Morsin, Marlia (2025) Theoretical analysis of boosting electromagnetic absorbance with mesh line metamaterial absorbers on silicon in the visible spectrum. Materials Science & Engineering B, 318. pp. 1-8.
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Abstract
Metamaterial absorbers have garnered significant attention due to their wide range of applications. A mesh-line metamaterial, in particular, can function effectively as an electromagnetic absorber. This absorber type is integrated with a silicon layer, with the width of the mesh lines varying between 10 nm and 40 nm. Among these, the 20 nm mesh-line metamaterial achieves the highest absorbance. By tailoring the impedance and refractive index properties, the mesh-line metamaterial minimizes both reflectance and transmittance, resulting in high absorbance. For comparison, the absorbance of bare silicon is approximately 0.09 at 0.77 PHz, whereas silicon with a 20 nm mesh-line metamaterial exhibits a significantly enhanced absorbance of 0.56 at 0.66 PHz.
| Item Type: | Article |
|---|---|
| Uncontrolled Keywords: | Absorbance Impedance Mesh line Metamaterial Refractive index Silicon |
| Subjects: | Q Science > QC Physics |
| Divisions: | Faculty of Electrical and Electronic Engineering > FKEE |
| Depositing User: | Mr. Mohamad Zulkhibri Rahmad |
| Date Deposited: | 31 Aug 2025 09:49 |
| Last Modified: | 31 Aug 2025 09:50 |
| URI: | http://eprints.uthm.edu.my/id/eprint/13173 |
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