Parameter optimerization for photo polymerization of microstereolithography

Khairu, K. and Raman, I. and Mohamed, M. A. S. and Ibrahim , Mustafa and Wahab, Md Saidin (2012) Parameter optimerization for photo polymerization of microstereolithography. In: International Conference on Advanced Material Engineering & Technology (ICAMET 2012) , 28-30 November 2012, Penang, Malaysia.



This paper presents a research on composition photo absorber (Sudan I) effect based on curing parameter, the Liquid Crystal Display (LCD) projector as energy light source initiated the photo reactive polymer. The polymer based material with composition of 1, 6- Hexanediol dicrylate, Phenylbis(2,4,6-trimethylbenzoyl) phosphine oxide with varied Sudan I concentration was used to build 3D structures. The structure was fabricated with three different photo absorber concentrations 0.002%, 0.003%. and 0.006%. of Sudan I. In this experiment the photoreactive polymer solidification phenomena was evaluated.The experiment result obtained, that exposed time of the varied photo absorber was most significantly affect the surface roughness values and the solidification layer time regardless the layer thickness. This work represents that photo absorber composition solution gave a different characteristics for 3D microstructure fabrication.

Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:rapid prototyping; microstereolithography photoreactive polymer; photoabsorber; exposed time; layer thickness; 3D microstructure
Subjects:T Technology > TA Engineering (General). Civil engineering (General) > TA401-492 Materials of engineering and construction. Mechanics of materials
Divisions:Faculty of Mechanical and Manufacturing Engineering > Department of Manufacturing and Industrial Engineering
ID Code:3490
Deposited By:Normajihan Abd. Rahman
Deposited On:28 Mar 2013 15:58
Last Modified:21 Jan 2015 16:20

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