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Measurement of plasma parameters in Ar/O2 magnetron sputtering Zn plasma using Langmuir probe

Nayan, Nafarizal and Mohamed Ali, Riyaz Ahmad and Anak Raniah, Andreas Albert and Terk, Ang Tse (2011) Measurement of plasma parameters in Ar/O2 magnetron sputtering Zn plasma using Langmuir probe. In: The 20th International Symposium on Plasma Chemistry, July 24 - 29, 2011, Philadelphia USA .


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Reactive sputtering technique using Zn metal target represents one of the simplest and most effective technique which has been used by many researchers. In the present work, we investigate the properties of reactive magnetron sputtering plasma using Zn target. The magnetron sputtering plasmas were produced using radio frequency (rf) power supply in Ar and Ar+O2 as ambient gas. A Langmuir probe was used to collect the current from the plasma. From the current intensity, the electron density and electron temperature were calculated. The properties of reactive magnetron Zn sputtering plasma at various discharge conditions were studied. Basically, at rf power of 100 W, the electron density and electron temperature in Ar ambient gas (at 20 mTorr gas pressure) were 1010 cm-3 and 2 eV, respectively. In addition, the plasma properties changed drastically when the Ar+O2 gas was used in magnetron sputtering plasma. The density evaluated from the electron saturation region showed the decrease from 1010 to 109 cm-3.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: reactive magnetron sputtering, zinc oxide thin film, Langmuir probe analysis.
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK1-300 Electrical engineering. Electronics. Nuclear engineering
Depositing User: M.Iqbal Zainal A
Date Deposited: 05 Oct 2011 07:08
Last Modified: 05 Oct 2011 07:08
URI: http://eprints.uthm.edu.my/id/eprint/2025
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