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Temporal variations of radiative Ti, Ti* and Ar densities in pulsed-modulated rf magnetron sputtering plasmas

Nayan, Nafarizal and N., Takada and K., Sasaki Temporal variations of radiative Ti, Ti* and Ar densities in pulsed-modulated rf magnetron sputtering plasmas. Compilation of Papers 2009 - VOLUME 1.

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Abstract

The temporal variations of the optical emission intensities of Ti, Ti*, and Ar were measured in pulse-modulated rf magnetron sputtering plasmas. The relationship between the production of Ti' and the radiative Ti, Ti*, and Ar densities in sputtering plasmas was discussed. We found that the intensities of the Ti and Ar lines dropped rapidly in the initial afterglow. However, in the late afterglow, the intensities increased and had the second peaks. This result indicates the productions of radiative Ti and Ar in the afterglow, attributing to recombination of TiC and Art with electrons. On the other hand, we found no second peak in the intensity of the Tit line in the afterglow plasma.

Item Type: Article
Uncontrolled Keywords: magnetron sputtering plasma; ionization processes; optical emission spectroscopy; recombination
Subjects: T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK7800-8360 Electronics
Divisions: Faculty of Electrical and Electronic Engineering > Department of Electrical Technology
Depositing User: Normajihan Abd. Rahman
Date Deposited: 15 May 2012 00:47
Last Modified: 15 May 2012 00:47
URI: http://eprints.uthm.edu.my/id/eprint/2457
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