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Deposition of a carbon nanocomposite film using magnetron sputtering

Tsutsumi, T. and Takada, N. and Nayan, Nafarizal and Sasaki, K. Deposition of a carbon nanocomposite film using magnetron sputtering. Compilation of Papers - VOLUME 1.

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Abstract

A conventional magnetron sputtering system was used for depositing a conductive nanocomposite film which consisted of diamond-like carbon (DLC) and carbon nanoparticles. The synthesis process was composed of three steps. The first step was the deposition of carbon nanoparticles, which was realized by operating the magnetron sputtering source with pure argon at a pressure of 400 mTorr. The second step was the deposition of a DLC film, which was realized by operating the magnetron sputtering source with mixture of argon and hydrogen at a pressure of 5 mTorr. The third step was the removal of the DLC film on nanoparticles. The removal of the DLC film was realized using amixture plasma of argon and oxygen, which was produced by applyingan rf power to the substrate holder

Item Type: Article
Subjects: Q Science > Q Science (General)
Divisions: Faculty of Electrical and Electronic Engineering > Department of Electrical Technology
Depositing User: Normajihan Abd. Rahman
Date Deposited: 06 Jun 2012 03:31
Last Modified: 12 Jan 2016 02:50
URI: http://eprints.uthm.edu.my/id/eprint/2474
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