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Characterization of TiAlBN nanocomposite coating deposited via radio frequency magnetron sputtering using single hot-pressed target

Mohd Rosli, Zulkifli and Kwan, Wai Loon and Mohamad Juoi, Jariah and Nayan, Nafarizal and Mahamud, Zainab and Yusuf, Yusliza (2012) Characterization of TiAlBN nanocomposite coating deposited via radio frequency magnetron sputtering using single hot-pressed target. In: International Conference on Advanced Material Engineering & Technology (ICAMET 2012) , 28-30 November 2012, Penang, Malaysia.

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Abstract

TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency (RF) magnetron sputtering technique. A single hot-pressed Ti-Al-BN target was used for the deposition process. With glancing angle X-ray diffraction analysis (GAXRD), the nanocrystalline (nc-) (Ti,Al)N phase was identified. In addition, the existence of BN and TiB2 amorphous (a-) phase were detected by X-ray photoelectron spectroscopy (XPS) analysis. Thus, the deposited TiAlBN coatings were confirmed as nc-(Ti,Al)N/a-BN/a-TiB2 nanocomposite. On the other hand, it was found that optimum bias voltage used in present study is -60 V where the deposited TiAlBN coating exhibits an excellent adhesion quality. The adhesion quality of the coatings deposited at -60V bias voltage is classified as HF 1 evaluated using the Rockwell-C adhesion test method (developed by the Union of German Engineers).

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: TiAlBN coating; nanocomposite; RF magnetron sputtering; GAXRD; XPS; Rockwell-C adhesion test
Subjects: T Technology > TA Engineering (General). Civil engineering (General) > TA401-492 Materials of engineering and construction. Mechanics of materials
Divisions: Faculty of Electrical and Electronic Engineering > Department of Electronic Engineering
Depositing User: Normajihan Abd. Rahman
Date Deposited: 28 Mar 2013 04:04
Last Modified: 21 Jan 2015 08:20
URI: http://eprints.uthm.edu.my/id/eprint/3483
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