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Effect of substrate material on the deposition of polycrystalline diamond: an XRD analysis

Yong, Tze Mi (2011) Effect of substrate material on the deposition of polycrystalline diamond: an XRD analysis. In: 3rd Regional Materials Technology Conference 3RMTC, 26-27 April 2011, Miri, Sarawak.


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Deposition of Polycrystalline Diamond (PCD) has been done simultaneously on two substrates namely silicon nitride (Si3N4) and tungsten carbide (WC), two materials commonly used as cutting tools, in a hot filament chemical vapour deposition (HFCVD) reactor. This research describes a comparison of XRD analysis of PCD deposited, as the substrate surface were pretreatment were manipulated in order to have better adhesion while influencing the diamond coating properties. Two surface pretreatments were carried out on Si3N4 substrate i.e. chemical treatment and mechanical treatment whereas for WC substrate, only chemical treatment gave promising results. After that, both pretreated substrates undergo seeding process to enhance diamond nucleation. The seeding process was varied with different concentration of silicon carbide (SiC) for WC substrate. The analysis of XRD results consist of qualitative analysis, and semi-quantitative analysis, including preferred orientation by manipulation of the growth parameter, α, and using Bragg-Brentano method. The results show that comparison of the PCD grown on two substrates, Si3N4 and WC, shows Si3N4 preferes (111) planes more than diamonds grown on WC. WhileWC preferes (110) planes more than diamonds grown on Si3N4.

Item Type: Conference or Workshop Item (Paper)
Uncontrolled Keywords: polycrystalline diamond; HFCVD; substrates; Si4N3; WC; diamond coated tools
Subjects: T Technology > T Technology (General)
Divisions: Faculty of Engineering Technology > Department of Mechanical Engineering Technology
Depositing User: Normajihan Abd. Rahman
Date Deposited: 13 Aug 2018 03:39
Last Modified: 13 Aug 2018 03:39
URI: http://eprints.uthm.edu.my/id/eprint/8238
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