The first inverter fabrication in UTHM cleanroom using cost effective mask

Sahdan, Mohd Zainizan and Saim, Hashim and Ruslan, Siti Hawa and Sanudin, Rahmat and Abd Wahab, Mohd Helmy (2007) The first inverter fabrication in UTHM cleanroom using cost effective mask. In: World Engineering Congress 2007, 5-9 August 2007, Penang, Malaysia.

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Abstract

In MOSFET fabrication process, the process recipe is very important. A good process recipe will produce good MOSFET device. Universiti Tun Hussein Onn Malaysia (UTHM) has setup a cleanroom for ISO Class 100 and Class 1000. However, our cleanroom do not have its own recipe to develop MOSFET device. Therefore, it is a challenge for UTHM research group to develop this recipe. In this work, the first attempt to develop a process recipe for nMOS inverter has been done, which involved three stages. The first stage was designing and fabrication of cost effective mask using transparency films with channel length range from 500um to 30um. Then, the second stage was optimizing the process parameters. Finally, the third stage was fabrication of nMOS inverter using Modu-lab fabrication toolset. The nMOS inverter was successfully fabricated and this work becomes a starting point for the UTHM research group to do further research in nanoscale transistor and Microelectromechanical System (MEMS) device.

Item Type:Conference or Workshop Item (Paper)
Uncontrolled Keywords:cleanroom; process recipe; nMOS inverter and MEMS
Subjects:T Technology > TK Electrical engineering. Electronics Nuclear engineering > TK7800-8360 Electronics
Divisions:Faculty of Electrical and Electronic Engineering > Department of Electronic Engineering
ID Code:3291
Deposited By:Normajihan Abd. Rahman
Deposited On:26 Feb 2013 11:27
Last Modified:21 Jan 2015 15:40

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